Low-Loss Dielectric Materials Characterization
Circuit designers need dielectric property data for materials at millimeter-wave (mmWave) frequencies to optimize device performance of new hardware and for quality assurance. However, there are no standard traceable reference materials or even agreed upon characterization test methods for materials at mmWave frequencies. Further, at higher frequencies, smaller test samples are required, placing more stringent limits on the allowable dimensional variations in those samples. Without reliable mmWave materials data, manufacturers are forced to extrapolate materials data from low frequencies to high frequencies, which can lead to mistakes that have potentially devastating costs.
Technical Needs, Gaps and Solutions
The technology issues surrounding materials characterization, the associated needs, technology status of those needs, as well as gaps and challenges to overcome, are summarized below. The time period considered is from 2023 to 2033.
Technology Status Legend
For each need, the status of today’s technology is indicated by label and color as follows:
In-table color + label key | Description of Technology Status |
---|---|
Solutions not known | Solutions not known at this time |
Solutions need optimization | Current solutions need optimization |
Solutions deployed or known | Solutions deployed or known today |
Not determined | TBD |
Table 1. mmWave Material Characterization Needs, Gaps, and Today’s Technology Status with Respect to Current and Future Needs
| ROADMAP TIMEFRAME | |||
TECHNOLOGY ISSUE | TODAY (2023) | 3 YEARS (2026) | 5 YEARS (2028) | 10 YEARS (2033) |
CHARACTERIZATION FREQUENCY RANGE | ||||
NEED | Tools needed for 28-110 GHz | Tools needed at D-band (110-170 GHz) | Tools needed G-band (220-350 GHz) | Tools needed for >500 GHz |
CURRENT TECHNOLOGY STATUS | Solutions deployed or known | Solutions need optimization | Solutions not known | |
GAP | Limited tool availability for high frequencies | Few tool options | Robustness and availability | |
CHALLENGE | High frequencies place burden on mechanical precision of equipment | Methods still in academic space | ||
CHALLENGE | - | Supporting equipment is expensive (i.e., 100 GHz VNA) | Expensive supporting equipment | |
CHALLENGE | High equipment cost | |||
ANISOTROPIC MATERIAL CHARACTERIZATION | ||||
NEED | Average in-plane or out-of-plane characterizations dominant, little capability for separating in-plane electromagnetic (EM) components | Separate in-plane and out-of-plane EM components (Ex,Ey,Ez) using the same test sample, but different tools; or same tool/different samples | Separate in-plane and out-of-plane EM components (Ex,Ey,Ez) using the same test sample and same tool set | |
CURRENT TECHNOLOGY STATUS | Solutions deployed or known | Solutions need optimization | Solutions not known | |
GAP | None | Few new fundamentally different methods are in development | ||
CHALLENGE | High frequencies limit flexibility of sample dimensions with known methods | |||
| Sample geometry incompatibilities across equipment sets | |||
VARIATION IN SAMPLE THICKNESS | ||||
NEED | Results generally have 1:1 error with thickness variation | Results less sensitive to thickness variation | Sources of uncertainty not dominated by thickness variation | Sources of uncertainty with only minimal dependence on thickness variation |
CURRENT TECHNOLOGY STATUS | Solutions deployed or known | Solutions not known | Solutions not known | |
GAP | Good, uniformly thick samples are not typically available for materials of interest | |||
CHALLENGE | Difficult to get good characterizations if samples are not uniformly thick | Methods with less sensitivity to sample thickness uniformity not known for samples in thin sheet format | No known methods that are good for low-loss materials without sensitivity to sample thickness uniformity | |
TOOL COMPATIBILITY WITH SAMPLE THICKNESS LIMITATIONS (FOR INDUSTRIAL MATERIAL) | ||||
NEED | (50 um-150 um for Er<5, Freq<60GHz) | Expanded capability thickness range – up to 500 um, 100 GHz | Expanded capability thickness range 1 mm or more, and down to 10 um, up to 100 GHz | Expanded capability thickness range above 1 mm and below 10 um |
CURRENT TECHNOLOGY STATUS | Solutions deployed or known | Solutions not known | Solutions not known | |
GAP | None | |||
CHALLENGE | Some industries have samples that are not available in thin sheets | Evolutionary methods may be limited to thin samples, may need new methods | Input materials will have significant thickness variation | |
SAMPLE THICKNESS MEASUREMENT ACCURACY | ||||
NEED | Single point thickness +- 3 um reproducibility using micrometers or drop gauges | Accurate non-contact optical methods + 3D point cloud measurements | Easy, accurate, non-contact methods | Easy, inexpensive accurate, non-contact methods |
CURRENT TECHNOLOGY STATUS | Solutions deployed or known | Solutions need optimization | Solutions not known | |
GAP | Thickness assessment directly impacts final results, errors in thickness result in significant errors in final result | |||
CHALLENGE | Samples may have spatial thickness variation that needs to be comprehended | Optical thickness systems are uncommon and expensive | ||
CHALLENGE | Samples may be compliant and compress under micrometer use | |||
CHALLENGE | Optical methods may be sensitive to sample appearance | |||
THERMAL CHARACTERIZATION | ||||
NEED | Characterization at room temperature | Easy characterization over temperature | Increased number of techniques capable of temperature characterization | Extended characterization range <100mK, >300C for space and other applications |
CURRENT TECHNOLOGY STATUS | Solutions deployed or known | Solutions need optimization | ||
GAP | None | Few methods/equipment sets compatible with elevated temperature or environmental conditions. | ||
CHALLENGE | Operator interaction with levers and equipment fixtures at elevated temperatures not compatible with safety requirements | Instrumentation compatibility with extreme temperatures
| ||
CHALLENGE | ||||
HUMIDITY CHARACTERIZATION | ||||
NEED | Measurement of humidity-soaked samples possible but limited to few equipment types | Humidity characterization capability more routine | Tools widely compatible with humidity characterization | No change in need |
CURRENT TECHNOLOGY STATUS | Solutions need optimization | |||
GAP | Humidity characterization is difficult | |||
CHALLENGE | Thin samples can absorb and release environmental moisture quickly - over the span of a few minutes | |||
STANDARD REFERENCE MATERIAL | ||||
NEED | No standard | Below 110 GHz discrete frequencies in-plane | Below 110 GHz in-plane and out-of-plane |
|
CURRENT TECHNOLOGY STATUS | Solutions not known |
| ||
GAP |
| |||
CHALLENGE | Industry needs to consume SRMs (standard reference materials) to be viable for national labs to support funding |
| ||
OUT OF PLANE QUALITY CONTROL MEASUREMENTS | ||||
NEED | Limited accuracy or availability of methods fast enough for quality control. | Faster, QC compatible methods that retain accuracy | Equipment sets designed for fast, accurate QC testing | |
CURRENT TECHNOLOGY STATUS | Solutions need optimization | |||
GAP | Many QC measurements need out of plane characterizations | Many QC measurements need real-time, out of plane characterizations | ||
CHALLENGE | QC requires rapid, easy and accurate results, ideally non-destructive to the test sample |
Approaches to address Needs, Gaps and Challenges
Table 2 considers approaches to address the above needs and challenges. The evolution of these is projected out over a 10-year timeframe using technology readiness levels.
Table 3 presents a range of material characterization techniques relevant for mmWave frequencies. For further information please see the iNEMI project reports [1], [2].
In-table color key | Range of technology readiness levels | Description |
---|---|---|
2 | TRL: 1 to 4 | Levels involving research |
6 | TRL: 5 to 7 | Levels involving development |
9 | TRL: 8 to 9 | Levels involving deployment |
Table 2. mmWave Materials Characterization Solutions
|
| EXPECTED TRL LEVEL | |||
TECHNOLOGY ISSUE | POTENTIAL SOLUTIONS | TODAY (2023) | 3 YEARS (2026) | 5 YEARS (2028) | 10 YEARS (2032) |
ANISOTROPIC MATERIAL CHARACTERIZATION | Develop new and disruptive methods for material characterization | 3 | 4 | 5 | 9 |
Converge on common sample geometry | 3 | 5 | 7 | 9 | |
SAMPLE THICKNESS VARIATION | Hand-picked samples | 9 | 9 | 9 | 9 |
Use of mechanical methods to modify existing samples to improve thickness uniformity | 4 | 4 | 4 | 4 | |
Develop new methods with less sensitivity to thickness variation | 1 | 2 | 3 | 5 | |
TOOL COMPATIBILITY WITH SAMPLE THICKNESS LIMITATIONS | Use of mechanical thinning of samples | 4 | 4 | 4 | 4 |
Improve mathematical modeling to enable thicker samples | 1 | 2 | 3 | 3 | |
Develop new cavity types or methods that inherently support thicker samples | 1 | 3 | 5 | 8 | |
SAMPLE THICKNESS MEASUREMENT ACCURACY | Map of points across samples | 5 | 7 | 8 | 9 |
Use of cost-effective optical methods | 1 | 4 | 5 | 7 | |
Use of available traceable standards of different material types | 5 | 6 | 6 | 6 | |
THERMAL CHARACTERIZATION | Design fixturing with thermal considerations and operator safety in mind (120OC) | 5 | 6 | 7 | 7 |
Improve processing and measurement speed | 6 | 8 | 9 | 9 | |
HUMIDITY CHARACTERIZATION | Utilize fast measurement techniques to allow humidity soaked samples to be rapidly measured | 4 | 7 | 8 | 9 |
CHARACTERIZATION FREQUENCY RANGE FOR 60-300GHz | Develop new tools and techniques for 60-300 GHz | 2 | 3 | 4 | 8 |
Use of advanced manufacturing techniques | 5 | 5 | 5 | 5 | |
Use of customized equipment rather than utilizing an overly capable VNA - Example Q meter | 2 | 5 | 7 | 8 | |
STANDARD REFERENCE MATERIAL | Encourage equipment suppliers to supply traceable standards as tool references | 4 | 8 | 9 | 9 |
OUT OF PLANE QUALITY CONTROL MEASUREMENTS | Design custom methods to meet specific QC needs | 2 | 4 | 5 | 8 |
Table 3. Comparison of common material measurement techniques
Frequency | Features | 2023 TRL | 2028 TRL | Comments | |
Split-post dielectric resonator (SPDR) | Discrete frequency points from 1 GHz up to 15 GHz |
| NA | NA | Current (2023) TRL is 8, but limited to below 20 GHz. Therefore, not applicable for mmWave. |
Split-cylinder resonator (SCR) | Discrete frequency points from 10 GHz up to 80 GHz |
| 8 | 9 | Identified as a first candidate method for SRM (standard reference material) development below 110 GHz |
Balanced-type circular disk resonator (BCDR) | Multiple discrete frequency points from 10 GHz up to 120 GHz |
| 6 | 8 |
|
Fabry-Perot open resonator (FPOR) | Multiple discrete frequencies between 20 GHz up to 120 GHz |
| 7 | 9 |
|
Co-planar waveguide (CPW) | Continuous frequencies between 1 kHz up to 1000 GHz |
| 4 | 7 |
|
Microstrip line charaterization |
|
| 4 | 6 |
|
Bereskin stripline transmission line method | Continuous frequencies between 1 GHz up to 20 GHz |
| NA | NA | Current (2023) TRL is 7, but lacks the necessary precision. |
On-chip resonators and microstrip-ring resonators (MRR) | Discrete frequencies between 1 GHz up to 50 GHz |
| 3 | 5 |
|
Time-domain materials characterization techniques | 15 GHz - 150 GHz |
| 3 | 5 | A few companies advertise THz systems – further assessment needed. |
Free-space materials characterization techniques | Up to 1.1 THz |
| 3 | 4 |
|
(*) TRL = technology readiness level, a readiness metric between 1 and 9
References
iNEMI, “iNEMI 5G Project Report 1: Benchmark Current Industry Best Practices for Low Loss Measurements”, Nov. 2020.
iNEMI, “iNEMI 5G Project Report 2: Benchmark Emerging Industry Best Practices for Low Loss Measurements”, Nov. 2020.
IEC TC 91 - Electronics assembly technology, “Test methods for electrical materials, printed boards and other interconnection structures and assemblies - Part 2-721: Test methods for materials for interconnection structures - Measurement of relative permittivity and loss tangent for copper clad laminate at microwave frequency using a split post dielectric resonator,” IEC 61189-2-721:2015, 29 April 2015.
IPC High Frequency Resonator Test Method Task Group (D-24c), “Relative Permittivity and Loss Tangent Using a Split-Cylinder Resonator“, IPC-TM-650 2.5.5.13, January 2017.
IEC TC 46/SC 46F - RF and microwave passive components, “Measurement of the complex permittivity for low-loss dielectric substrates balanced-type circular disk resonator method,” IEC 63185:2020, 8 December 2020.
JIS, “Measurement method for dielectric properties of fine ceramics in millimeter wave frequency range - Part 2: Open resonator method”, JIS R 1660-2-2004 (R 2008)(R 2013), 20 March 2004.
As part of the 5G/6G MAESTRO project, work on this page is supported by the Office of Advanced Manufacturing in the National Institute of Standards and Technology (NIST), under the Federal Award ID Number 70NANB22H050